2021.12.08
Model F-REX300XA
In December, EBARA CORPORATION (EBARA) unveiled a new chemical polishing system “Model F-REX300XA”.
Along with growing demands of semiconductors, further high productivity is needed in the market. While devices are evolving to achieve high performance, EBARA unveiled a new chemical polishing system "Model F-REX300XA" in order to respond to strictly technical requirements from customers.
1) The highest productivity in our history
Newly developed highly efficient transfer mechanisms as well as WPH optimization algorithm further enhance productivity.
2) Highly reliable, flexible, improved yield
Keeping the highly reliable structure with one table, one head, and dual module system, it carries flexible transfer, polishing system to reduce quality variation, and increased cross-contamination prevention to improve yield.
3) Environment-friendly
Compared with the existing Model F-REX300X, power consumption decreases by 10%. The product design is upgraded with the decreased number of components contributing to supply chain CO2 emissions.
The panel exhibitions are scheduled as follows.
| Semicon West | 12/7-9 | Moscone Center (CA, USA) |
| Semicon Japan | 12/15-17 | Tokyo Big Site |
| Semicon Taiwan | 12/28-30 | Taipei Nangang Exhibition Center (Taiwan) |
The EBARA Group aims to contribute to the achievement of the Sustainable Development Goals (SDGs) by addressing material issues identified in its long-term vision and executing the medium-term management plan to increase corporate value.