Combustion-type exhaust abatement systems
Batch treatment of multiple gas types
Highly efficient abatement of PFCs
Byproduct removal measures/automatic removal of powdery byproducts
Low running cost
High up-time
On-demand operation to suit gas type and volume
Greater ease of maintenance
CE marking/SEMI-S2/NRTL available
The Model G5 range is a combustion-type exhaust abatement system that offers highly efficient abatement of many different gases used in manufacturing operations. Capable of batch treatment of multiple types of gases and of highly efficient treatment of PFCs, which are usually difficult to abate. With unique measures to remove byproducts and on-demand operation with variable fuel volume to suit the type and volume of gas being abated, Model G5 achieves reductions in running costs. Ideal for applications in the manufacturing operations of electric components such as semiconductors, LCD panels, solar cells, and LEDs, chemicals and materials manufacture, and research laboratories. Range includes large capacity models with flow rates of 1,200 L/min.
| Model | Unit | G5-350 A1~A4/P1~P4 | G5-500 A1~A4/P1~P4 | G5-600 A1~A4/P1~P4 | G5-1200 A1~A4/P1~P4 |
| Abatement method | burn+ wet | burn+ wet | burn+ wet | burn+ wet | |
| Max. inflow gas volume | L/min | 350 | 500 | 600 | 1200 |
| Fuel | City gas or propane gas | City gas or propane gas | City gas or propane gas | City gas or propane gas | |
| Dimensions | W x D x H mm | 1,200 x 650 x 1,900 | 1,200 x 650 x 1,900 | 1,200 x 1,100 x 2,000 | 1,200 x 1,100 x 2,200 |
| Gases (e.g.) | Process (depo) gases Cleaning gases, including SiH4, PH3, GeH4, NH3, SiH2Cl2, TEOS, B2H6, H2 NF3, ClF3, HF, F2, HCl, COF2, etc. Etching gases – all types HBr, Cl2, SiCl4, BCl3, CO, C5F8, C4F6, etc. PFCs CF4, C2F6, C3F8, CHF3, SF6, etc. |
Process (depo) gases Cleaning gases, including SiH4, PH3, GeH4, NH3, SiH2Cl2, TEOS, B2H6, H2 NF3, ClF3, HF, F2, HCl, COF2, etc. Etching gases – all types HBr, Cl2, SiCl4, BCl3, CO, C5F8, C4F6, etc. PFCs CF4, C2F6, C3F8, CHF3, SF6, etc. |
Process (depo) gases SiH4, PH3, GeH4, NH3, SiH2Cl2, TEOS, B2H6, H2 Cleaning gases - all types NF3, ClF3, HF, F2, HCl, COF2, etc. Etching gases – all types HBr, Cl2, SiCl4, BCl3, CO, C5F8, C4F6, etc. PFCs CF4, C2F6, C3F8, CHF3, SF6, etc. |
Process (depo) gases SiH4, PH3, GeH4, NH3, SiH2Cl2, TEOS, B2H6, H2 Cleaning gases - all types NF3, ClF3, HF, F2, HCl, COF2, etc. Etching gases – all types HBr, Cl2, SiCl4, BCl3, CO, C5F8, C4F6, etc. PFCs CF4, C2F6, C3F8, CHF3, SF6, etc. |
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| Standard equipment | Burner scraper for powder removal | Burner scraper for powder removal | Burner scraper for powder removal | Burner scraper for powder removal | |
| Options | City water/drainage consumption reduction unit | City water/drainage consumption reduction unit | City water/drainage consumption reduction unit | City water/drainage consumption reduction unit | |
model TND
Combustion-type exhaust abatement system with low NOx emissions and abundant reaction byproduct measures for reduced maintenance costs.
model G6
Combustion-type exhaust abatement system for large flow volumes of up to 1,200 L/min
model FDS
Dry exhaust abatement system for highly efficient and safe treatment of PFC gases with no need for water scrubbing
Integrated dry vacuum pump/gas abatement systems
Enables optimization of chamber exhaust/exhaust gas abatement process, reduces integration and management costs